Isishwankathelo sePhotoresist
I-Photoresist, eyaziwa ngokuba yi-photoresist, ibhekisa kwi-film material ebhityileyo enokunyibilika kwayo xa ibonakaliswa kukukhanya kwe-UV, imisebe ye-electron, imisebe ye-ion, ii-X-ray, okanye eminye imisebe.
Yenziwe nge-resin, i-photoinitiator, i-solvent, i-monomer, kunye nezinye izongezo (jonga iTheyibhile 1). I-resin ye-Photoresist kunye ne-photoinitiator zezona zinto zibalulekileyo ezichaphazela ukusebenza kwe-photoresist. Isetyenziswa njenge-anti-corrosion coating ngexesha lenkqubo ye-photolithography.
Xa kusetyenzwa iindawo ze-semiconductor, ukusebenzisa i-photoresist ekhethiweyo ngokufanelekileyo kunokudala umfanekiso ofunekayo kumphezulu.
Itheyibhile 1.
| Izithako zePhotoresist | Ukusebenza |
| Isinyibilikisi | Yenza i-photoresist ibe manzi kwaye iguquguquke, kwaye ayinampembelelo phantse kwiipropati zeekhemikhali ze-photoresist. |
| Umqalisi wefoto | Ikwaziwa ngokuba yi-photosensitizer okanye i-photocuring agent, yinxalenye ekwaziyo ukuva ukukhanya kwizinto ezikhusela ukukhanya. Luhlobo lwekhompawundi enokubola ibe zii-free radicals okanye ii-cations kwaye iqalise ii-chemical cross-linking reactions kwii-monomers emva kokufunxa i-ultraviolet okanye amandla okukhanya abonakalayo obude obuthile be-wavelength. |
| Iresin | Ziipolymers ezingasebenziyo, kwaye zisebenza njengezibopheleli zokubamba izinto ezahlukeneyo kwi-photoresist kunye, zinika i-photoresist iimpawu zayo zoomatshini nezekhemikhali. |
| I-Monomer | Ikwaziwa ngokuba zii-active diluents, zii-molecules ezincinci eziqulethe amaqela asebenzayo anokupholisha kwaye zii-compounds ezinobunzima obuphantsi bee-molecular ezinokuthatha inxaxheba kwi-polymerization reactions ukuze zenze ii-resin ezinobunzima obukhulu bee-molecular. |
| Isongezelelo | Isetyenziselwa ukulawula iipropati ezithile zeekhemikhali ze-photoresists. |
Ii-Photoresist zahlulwe zibe ziindidi ezimbini eziphambili ngokusekelwe kumfanekiso eziwenzayo: ezilungileyo nezingalunganga. Ngexesha lenkqubo ye-photoresist, emva kokuvezwa nokuphuhliswa, iindawo ezibonakalayo zengubo ziyanyibilika, zishiya iindawo ezingatyhilekanga. Olu qweqwe luthathwa njengolwe-photoresist olulungileyo. Ukuba iindawo ezibonakalayo zihlala ngelixa iindawo ezingatyhilekanga zinyibilika, uqweqwe luthathwa njengolwe-photoresist olungalunganga. Ngokuxhomekeke kumthombo wokukhanya ovezwayo kunye nomthombo wemitha, ii-photoresists zihlelwa ngakumbi njenge-UV (kuquka ii-photoresists ezilungileyo nezingalunganga ze-UV), ii-photoresists ezinzulu ze-UV (DUV), ii-photoresists ze-X-ray, ii-photoresists ze-electron beam, kunye nee-photoresists ze-ion beam.
I-Photoresist isetyenziswa kakhulu ekucubungulweni kweepateni ezicoliweyo kwiiphaneli zokubonisa, iisekethe ezidityanisiweyo, kunye nezixhobo ze-semiconductor ezizimeleyo. Itekhnoloji yemveliso engasemva kwe-photoresist iyinkimbinkimbi, ineentlobo ngeentlobo zeemveliso kunye neenkcukacha. Ukuveliswa kweesekethe ezidityanisiweyo kushishino lwe-elektroniki kubeka iimfuno ezingqongqo kwi-photoresist esetyenzisiweyo.
I-Ever Ray, umenzi onamava eminyaka engama-20 okhethekileyo ekuveliseni nasekuphuhliseni iiresini ezinokunyangwa, uqhayisa ngomthamo wonyaka wemveliso weetoni ezingama-20,000, umgca wemveliso opheleleyo, kunye nokukwazi ukwenza ngokwezifiso iimveliso. Kwi-photoresist, i-Ever Ray ine-resin eyi-17501 njengeyona nto iphambili.
